Enhancement of laser/EUV conversion by shaped laser pulse interacting with Li-contained targets for EUV lithography

机译：异形激光脉冲与含锂靶相互作用的EUV光刻增强了激光/ EUV转换

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The advantages of droplet and claster Li-contained targets for debris free EUV generation are estimated on base of analytical modeling and simulation. Conversion efficiency of laser energy into EUV energy from such targets is found to reach a few percents. The laser prepulse is proposed to enhance the laser energy conversion into emission at wavelength of 13.5 nm.

机译：在分析建模和仿真的基础上，估算了无碎片EUV产生的含液滴和Cl的Li靶的优势。发现从这些目标将激光能量转换为EUV能量的效率达到百分之几。提出了激光预脉冲以增强激光能量转换成13.5 nm波长的发射。

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来源
《Conference on Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications; Aug 4-6, 2003; San Diego, California, USA》|2003年|p.128-136|共9页
会议地点 San Diego CA(US)
作者
A.A. Andreev; J.Limpouch; N.B.Voznesensky; A.P.Zhevlakov; V.E.Yashin;
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作者单位

Institute for laser physics, Birzhevaya line, 12, St. Petersburg, 199034, Russia;

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会议组织
原文格式 PDF
正文语种 eng
中图分类物理学;
关键词
nanolithography; laser produced plasma; conversion; droplet; claster; line emission; master oscillator; amplifier;

机译：纳米光刻；激光产生的等离子体；转换；液滴；束；线发射；主振荡器；放大器;

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专利

1. Using Temporally Synthesized Laser Pulses to Enhance the Conversion Efficiency of Sn Plasmas for EUV Lithography [J] . Liang Yin, Hanchen Wang, Brendan A. Reagan, Photonics Journal, IEEE . 2021,第1期

机译：使用时间综合的激光脉冲来提高EUV光刻Sn等离子体的转换效率
2. Effects of plasma spatial profile on conversion efficiency of laser-produced plasma sources for EUV lithography [J] . Ahmed Hassanein Valeryi Sizyuk Tatyana Sizyuk and Sivanandan Harilal Journal of Micro/Nanolithography,MEMS and MOEMS . 2009,第4期

机译：等离子体空间轮廓对EUV光刻激光产生等离子体源转换效率的影响
3. Liquid-jet target laser-plasma sources for EUV and X-ray lithography [J] . L. Rymell, L. Malmqvist, M. Berglund Microelectronic Engineering . 1999,第1a4期

机译：用于EUV和X射线光刻的液体喷射目标激光等离子体源
4. Enhancement of laser/EUV conversion by shaped laser pulse interacting with Li-contained targets for EUV lithography [C] . Alexander A. Andreev, Jiri Limpouch, N. B. Voznesensky, Conference on laser-generated and other laboratory x-ray and EUV sources, optics, and applications . 2004

机译：激光/ EUV转换的增强通过成形激光脉冲与EUV光刻的含量靶向相互作用
5. Coherent EUV lithography with table-top laser. [D] . Urbanski, Lukasz. 2012

机译：使用台式激光的相干EUV光刻。
6. A Storage Ring Based Free-Electron Laser for Generating Ultrashort Coherent EUV and X-ray Radiation [O] . Chao Feng, Zhentang Zhao -1

机译：基于存储环的自由电子激光器用于产生超短相干EUV和X射线辐射
7. Effects of Plasma Spatial Profile on Conversion Efficiency of Laser Produced Plasma Sources for EUV Lithography [O] . A. Hassanein, V. Sizyuk, T. Sizyuk, 2014

机译：等离子体空间分布对EUV光刻激光产生等离子体源转换效率的影响

Enhancement of laser/EUV conversion by shaped laser pulse interacting with Li-contained targets for EUV lithography

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