Design of high average power clean EUV light source based on laser produced Xenon plasma

摘要

Important design factors are evaluated for a high average power, clean EUV light source by laser produced plasma. The basic requirements are high average power, high stability, and long lifetime, and these are closely relating with absorption loss by xenon, repetition rate, and fast ion generation. These subjects are evaluated based on experimental data and analytical model of a laser produced xenon plasma.