首页> 外文会议>Conference on Emerging Lithographic Technologies VI Pt.1, Mar 5-7, 2002, Santa Clara, USA >Worldwide technologies and the ITRS in the current economic climate
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Worldwide technologies and the ITRS in the current economic climate

机译:当前经济形势下的全球技术和ITRS

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The semiconductor industry has successfully undergone two major transitions, in the 70's and in the mid-80's, that have been followed by long periods of sustained growth. A third transition is approaching in the second half of this decade that promises to fuel the growth of the semiconductor industry well into the second decade of this century, if well executed. Many new materials and a renewed MOS structure will be necessary to revitalize the basic device capabilities. Lithography technology is a key enabler of the semiconductor industry. After a decade of discussions and heated debates, the lithography roadmap has been finally internationally accepted and the wavelengths of choice identified and agreed upon: 193nm, 157nm, and 13.5nm. Execution is now the name of the game. As the level of investments required for the development and deployment of the overall lithography infrastructure continues to escalate with time and as execution on a tight time table is a must, it is necessary to resort to any available cooperation among consortia, supplier companies and IC companies to maintain the semiconductor industry on the historical 25-30% cost reduction per function per year that has been, and still remains, at the center of its success.
机译:半导体行业在70年代和80年代中期成功经历了两次重大转型,随后又经历了长期的持续增长。如果执行得当的话,在本十年的后半期即将到来的第三次转型有望推动半导体产业的增长步入本世纪的第二个十年。要振兴基本器件功能,将需要许多新材料和新的MOS结构。光刻技术是半导体行业的关键推动力。经过十多年的讨论和激烈的辩论,光刻路线图终于被国际接受,并确定并商定了选择的波长:193nm,157nm和13.5nm。执行现在是游戏的名称。随着整个光刻基础设施的开发和部署所需的投资水平随着时间的推移不断升级,并且必须在紧凑的时间表上执行,有必要诉诸于财团,供应商公司和IC公司之间的任何可用合作保持半导体行业历史上每年每项功能25-30%的成本降低,而这种降低一直是并且仍然是其成功的核心。

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