【24h】

Worldwide technologies and the ITRS in the current economic climate

机译:全球技术和目前经济气候的ITRS

获取原文

摘要

The semiconductor industry has successfully undergone two major transitions, in the 70's and in the mid-80's, that have been followed by long periods of sustained growth. A third transition is approaching in the second half of this decade that promises to fuel the growth of the semiconductor industry well into the second decade of this century, if well executed. Many new materials and a renewed MOS structure will be necessary to revitalize the basic device capabilities. Lithography technology is a key enabler of the semiconductor industry. After a decade of discussions and heated debates, the lithography roadmap has been finally internationally accepted and the wavelengths of choice identified and agreed upon: 193nm, 157nm, and 13.5nm. Execution is now the name of the game. As the level of investments required for the development and deployment of the overall lithography infrastructure continues to escalate with time and as execution on a tight time table is a must, it is necessary to resort to any available cooperation among consortia, supplier companies and IC companies to maintain the semiconductor industry on the historical 25-30% cost reduction per function per year that has been, and still remains, at the center of its success.
机译:半导体产业已经成功进行的两大转变,在70年代,并在80年代中期,已其次是持续的长期增长。第三个转变在这十年的后半接近,有望推动半导体行业的增长已进入本世纪的第二个十年,如果能够很好执行。许多新的材料和重新MOS结构将需要振兴的基本设备功能。光刻技术是半导体产业的一个关键因素。讨论和激烈的辩论十年后,光刻路线图已经最终国际公认,并确定和商定选择的波长:193nm的,157纳米和13.5nm。现在执行的是游戏的名称。而对于整体光刻基础设施的开发和部署所需要的投资水平继续与时间和在紧张的时间表执行升级是必须的,有必要诉诸财团,供应商公司和IC公司之间的任何可用的合作维持半导体行业每功能的历史25-30%的成本削减每年已经和仍然存在,在其成功的核心。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号