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IC Yield Prediction and Analysis Using Semi-Empirical Yield Models and Test Data

机译:使用半经验良率模型和测试数据的IC良率预测和分析

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This paper presents the results of an extension to the concept of Micro-Yield (or Micro-Event) modeling presented in . We have developed a design attribute extraction and yield prediction software system that ― given the characterization of a semiconductor process via complex test chips that we call Characterization Vehicle test chips (or CV test chips), an IC product layout and a set of proprietary yield models ― computes detailed contributions of different yield models, of geometrical chip regions and of parts of the chip circuitry to the overall chip yield. The organization of the computed output allows easy comparison of predicted yields to inspection and electrical test measurements, where the electrical tests can include failure bit maps (FBM) for memories and scan test results for logic circuits. After we review the concept of the Yield Impact Matrix (YIMP), we define a more general Micro-Event paradigm and introduce the Extended YTMP. We discuss its application to yield loss root-cause analysis, review related work and present example applications of the overall system built around this concepts.
机译:本文介绍了扩展的Micro-Yield(或Micro-Event)建模概念的结果。我们已经开发了一种设计属性提取和良率预测软件系统,该系统“通过复杂的测试芯片来表征半导体工艺,我们将其称为特性车辆测试芯片(或CV测试芯片),IC产品布局和一组专有的良率模型―计算不同良率模型,几何芯片区域以及部分芯片电路部分对整体芯片良率的详细贡献。计算输出的组织使得可以轻松将预测的产量与检查和电气测试测量进行比较,其中电气测试可以包括存储器的故障位图(FBM)和逻辑电路的扫描测试结果。在回顾了收益影响矩阵(YIMP)的概念之后,我们定义了一个更通用的微事件范例,并介绍了扩展YTMP。我们讨论了其在产量损失根本原因分析中的应用,回顾了相关工作,并介绍了围绕此概念构建的整个系统的示例应用。

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