Projection lenses for high resolution ablation with excimer laser; high performance, wide field and high UV laser power

摘要

The productive and accurate ablation of microstructures demands the precise imaging of a mask pattern onto the substrawte under work. The job can be done with high performance wide field lenses as a key component of ablation equipment. The image field has dimensions of 2- to 30 mm. Typical dimensions and accuracy of the microstructures are in the order of some microns. On the other hand, the working depth of focus (DOF) has to be in the order of some 10 microns to be successful on drilling through 20 to 50 umm substrates. All these features have to be reached under the conditions of high power laser UV light.