Quantifying the Dynamics of Lithography Tool Support Systems

摘要

Optimum performance of a scanning photolithogrpahy tool is highly dependent upon the characteristics of its installation support system. Since the quality of the imaging product relies on precise control of the imaging process, vibration management is critical. Stiffness, mass, and inherent damping of the overall support system are the primary factors in determining whether the equipment is able to provide good process control under varied opterating conditions. Current generation lithography scanners employ internal reaction forces to ultimately stabilize their optical exposure systems.