Nanoimprint device useful in system for measuring dynamic flow lithography by nanoimpression, comprises first element for supporting substrate, second element for supporting mold of nanoimprint, gap making unit, and heating unit

摘要

The nanoimprint device comprises a first element (10) for supporting a substrate (6) of which one side is coated with a thermally polymerizable photosensitive resin such as a monomer resin to print, a second element (12) that is configured for supporting a mold (4) of nanoimprint and is to be fixed on the first element, a unit for making a gap between flexible membrane (18) and the second element, a UV source, and a unit for heating the resin. The mold comprises a side with patterns, where the side is laid in front of a side of the substrate covered with resin. The nanoimprint device comprises a first element (10) for supporting a substrate (6) of which one side is coated with a thermally polymerizable photosensitive resin such as a monomer resin to print, a second element (12) that is configured for supporting a mold (4) of nanoimprint and is to be fixed on the first element, a unit for making a gap between flexible membrane (18) and the second element, a UV source, and a unit for heating the resin. The mold comprises a side with patterns, where the side is laid in front of a side of the substrate covered with resin, is made of a material that is transparent to an optical beam, is immovable in the device, is maintained in the second element by flanges exerting lateral force on it, and is made of quartz or silica. The second element comprises a window closed by the mold, and allows the optical beam to cross the mold. The first element comprises a unit for moving the substrate to place the side of substrate covered with resin against the side of the mold comprising the patterns. The moving unit comprises flexible membrane defining a pressure chamber connected to a source of pressurized fluid. The pressure of the source is 5-8 bars. A flatness of the mold is less than 100 nm over an area of 20x 20 mm 2. The resin is used at a viscosity of less than 0.1 Pa.s. Independent claims are included for: (1) a system for measuring dynamic flow lithography; and (2) a nanoimprint process.