首页> 外文会议>Conference on advances in resist materials and processing technology XXVI; 20090223-25; San Jose, CA(US) >Defect Reduction by using Point-of-use Filtration in a New Coater/Developer
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Defect Reduction by using Point-of-use Filtration in a New Coater/Developer

机译:通过在新涂布机/显影机中使用使用点过滤来减少缺陷

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The impact of pore size and membrane material polarity on the effectiveness of point-of-use filtration is evaluated here. Decreased pore size and increased polarity in membrane materials were confirmed to positively influence the effectiveness of microbridge defect removal by a point-of-use filter in the LITHIUS Pro? coater/developer system. Comparative analysis of different solvent systems validates a model of competitive adsorption whereby more-hydrophilic solvents and gel-like agglomerates preferentially interact with the Nylon 6,6 membrane surface. This suggests that adsorption is the dominant mechanism for microbridge defect removal via filtration. Therefore, utilizing filtration products built around polar membrane materials (like hydrophilic Nylon 6,6) will result in greater microbridge defect reduction than solely reducing filter pore size.
机译:在此评估孔径和膜材料极性对使用点过滤效果的影响。膜材料中孔径的减小和极性的增加被证实对LITHIUS Pro?中的使用点过滤器去除微桥缺陷的有效性产生积极影响。涂布机/显影系统。对不同溶剂系统的比较分析验证了竞争性吸附的模型,由此更具亲水性的溶剂和凝胶状团聚物优先与尼龙6,6膜表面相互作用。这表明吸附是通过过滤去除微桥缺陷的主要机理。因此,与仅减小过滤器孔径相比,利用围绕极性膜材料(例如亲水性尼龙6,6)构建的过滤产品将导致更大的微桥缺陷减少。

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