首页> 外文会议>Conference on Advanced Optical Devices, Technologies, and Medical Applications Aug 19-22, 2002 Riga, Latvia >Investigation of processes of manufacturing hologram diffraction gratings based on As-S-Se layers
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Investigation of processes of manufacturing hologram diffraction gratings based on As-S-Se layers

机译:基于As-S-Se层的全息衍射光栅的制备工艺研究

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摘要

Results of investigation of processes providing formation of hologram diffraction gratings based on As_2S_3 layers are represented. Using the method of atomic force microscopy the groove profile shape is studied for these gratings in dependency on exposure values. Carried out are measurements of their diffraction efficiency dependencies and analysed is their relation to the relief shape of the grating surface.
机译:表示提供基于As_2S_3层的全息衍射光栅的形成的过程的研究结果。使用原子力显微镜的方法,根据曝光值研究了这些光栅的凹槽轮廓形状。对它们的衍射效率相关性进行了测量,并分析了它们与光栅表面凸纹形状的关系。

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