首页> 外文会议>Conference on Advanced Laser Technologies; Sep 15-20, 2002; Adelboden, Switzerland >Pulsed laser deposition of nanostructured carbon films for field emission
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Pulsed laser deposition of nanostructured carbon films for field emission

机译:用于场发射的纳米结构碳膜的脉冲激光沉积

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摘要

The technology of target production was developed and the regimes of their irradiation was determined. The investigation was made of electrofield emission characteristics of thin nanodiamond and glassy carbon films deposited by laser ablation of diamond and glassy carbon targets. X-ray analysis and Raman spectroscopy showed that there was no phase change in the target substance during the process of the target substance deposition upon the substrate. Emission currents up to 10 mA/cm~2 in the field of 20 V/μm were obtained. The numerical simulation of temperature fields distribution in the target material was carried out.
机译:开发了靶标生产技术,并确定了其照射方式。研究了通过金刚石和玻璃碳靶的激光烧蚀沉积的纳米金刚石薄膜和玻璃碳薄膜的电场发射特性。 X射线分析和拉曼光谱表明,在目标物质沉积在基板上的过程中,目标物质没有相变。在20 V /μm的场中可获得高达10 mA / cm〜2的发射电流。对目标材料中温度场分布进行了数值模拟。

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