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Nonlinear Optical Techniques for Characterization of Wide Bandgap Semiconductor Electronic Properties: Ⅲ-nitrides, SiC, and Diamonds

机译:表征宽带隙半导体电子特性的非线性光学技术:Ⅲ族氮化物,SiC和金刚石

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摘要

Combining interdisciplinary fields of nonlinear optics, dynamic holography, and photoelectrical phenomena, we developed the optical measurement technologies for monitoring the spatial and temporal non-equilibrium carrier dynamics in wide bandgap semiconductors at wide range of excitations (10~(15) to 10~(20) cm~(-3)) and temperatures (10 to 800 K). We explored advantages of non-resonant optical nonlinearities, based on a short laser pulse induced refractive or absorption index modulation (△n and △k) by free excess carriers. This approach, based on a direct correlation between the electrical and optical processes, opened a possibility to analyze dynamics of electrical phenomena in "all-optical" way, i.e. without electrical contacts. Carrier diffusion and recombination processes have been investigated in various wide band gap materials - differently grown GaN, SiC, and diamonds - and their key electrical parameters determined, as carrier lifetime, diffusion coefficient, diffusion length and their dependences on temperature and injected carrier density. The studies provided deeper insight into nonradiative and radiative recombination processes in GaN crystals, revealed diffusion-driven long nonradiative carrier lifetimes in bulk GaN and SiC, disclosed impact of delocalization in InGaN layers, and suggested a trap-assisted Auger recombination in highly-excited InN. Injection and temperature dependent diffusivity revealed a strong contribution of carrier-carrier scattering in diamond and bandgap renormalization in SiC.
机译:结合非线性光学,动态全息和光电现象的跨学科领域,我们开发了光学测量技术,可在宽激发(10〜(15)至10〜()范围内监视宽带隙半导体中的时空非平衡载流子动力学。 20)cm〜(-3))和温度(10至800 K)。我们基于自由的多余载流子通过短激光脉冲引起的折射率或吸收指数调制(△n和△k),探索了非共振光学非线性的优势。这种基于电气和光学过程之间的直接相关性的方法为以“全光学”方式(即没有电接触)分析电气现象的动力学提供了可能性。已经对各种宽带隙材料-不同生长的GaN,SiC和金刚石进行了载流子扩散和复合过程的研究,并确定了其关键电参数,如载流子寿命,扩散系数,扩散长度及其对温度和注入载流子密度的依赖性。这些研究提供了对GaN晶体中非辐射和辐射复合过程的更深入的洞察力,揭示了由扩散驱动的块状GaN和SiC中较长的非辐射载流子寿命,揭示了InGaN层中离域的影响,并提出了在高激发InN中的陷阱辅助俄歇复合。 。注入和温度相关的扩散率表明,金刚石中载流子-载流子散射和SiC中的带隙重归一化作用很大。

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  • 来源
  • 会议地点 Boston MA(US);Boston MA(US)
  • 作者单位

    Department of Semiconductor Optoelectronics, Institute of Applied Research, Vilnius University, Sauletekio al. 9-111, Vilnius, LT-10222 Lithuania,Department of Electrical and Computer Engineering, Virginia Commonwealth University, 601 W. Main Str., Richmond, Virginia 23284 USA;

    Department of Semiconductor Optoelectronics, Institute of Applied Research, Vilnius University, Sauletekio al. 9-111, Vilnius, LT-10222 Lithuania;

    Department of Semiconductor Optoelectronics, Institute of Applied Research, Vilnius University, Sauletekio al. 9-111, Vilnius, LT-10222 Lithuania;

    Department of Semiconductor Optoelectronics, Institute of Applied Research, Vilnius University, Sauletekio al. 9-111, Vilnius, LT-10222 Lithuania;

    Department of Semiconductor Optoelectronics, Institute of Applied Research, Vilnius University, Sauletekio al. 9-111, Vilnius, LT-10222 Lithuania;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 材料;材料;
  • 关键词

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