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PASSIVATION OF MONOATOMIC AND COMPOUND SEMICONDUCTORS BY GeO_xN_y FILM

机译:GeO_xN_y薄膜钝化单原子和复合半导体

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摘要

C-v characteristics of Al/GeO_xN_y/GaAs(Ge) metal-insulator-semiconductor (MIS) structures have been measured in the frequency range of 1kHZ-1MHz.The density of the interface states was found to be as low as (5-8)×10~(10) cm~(-2) eV~(-1). There Is no evidence of Fermi level pinning, and surface carrier inversion is clearly demonstrated. The pyrolytic GeO_xN_y film is recommended for high quality GaAs and Ge MIS device fabrication.
机译:在1kHZ-1MHz的频率范围内测量了Al / GeO_xN_y / GaAs(Ge)金属-绝缘体-半导体(MIS)结构的Cv特性,发现界面态密度低至(5-8) ×10〜(10)cm〜(-2)eV〜(-1)。没有费米能级钉扎的证据,表面载流子的倒置得到了清晰的证明。推荐将热解GeO_xN_y膜用于高质量GaAs和Ge MIS器件的制造。

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  • 来源
    《CAS'95 proceedings》|1995年|145-148|共4页
  • 会议地点 Sinaia(RO);Sinaia(RO)
  • 作者单位

    Institute of Cybernetics Academy of Sciences of Georgian Republic. Euli str.5, 380086 Tbilisi, Georgian Republic;

    Institute of Cybernetics Academy of Sciences of Georgian Republic. Euli str.5, 380086 Tbilisi, Georgian Republic;

    Institute of Cybernetics Academy of Sciences of Georgian Republic. Euli str.5, 380086 Tbilisi, Georgian Republic;

    Institute of Cybernetics Academy of Sciences of Georgian Republic. Euli str.5, 380086 Tbilisi, Georgian Republic;

    Institute of Cybernetics Academy of Sciences of Georgian Republic. Euli str.5, 380086 Tbilisi, Georgian Republic;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 半导体技术;
  • 关键词

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