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A Turn-On DC Surface-Potential-Based Drain Current Model for Fully-Depleted Poly-Si Thin Film Transistors

机译:全耗尽型多晶硅薄膜晶体管的基于直流表面电势的漏极电流模型

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摘要

A turn-on DC surface-potential-based drain current model for fully-depleted polycrystalline silicon thin film transistors is developed based on the charge sheet model considering both deep and tail acceptor trap states in the grain boundary and the effect of the back surface potential. By integrating the electron concentration, vertically to the polycrystalline silicon/oxide interface, along the inversion layer and using the average electric filed concept, the areal density of the inversion charge with the channel potential is deduced to calculate both the diffusion and the drift components. For the purpose of simplifying the process of the solution, the trapezoidal rule is used to avoid numerical integration in the drift current calculation. In order to further improve the calculation precision in the region where the whole channel is not completely strong inverted, the triangular method is adopted under certain mathematical constraints to replace the usage of the trapezoidal rule in the drift current calculation. Under different state densities, this proposed surface-potential-based drain current model is verified by 2D-device simulation in devices' transfer characteristics under various drain biases.
机译:基于电荷薄板模型,考虑了晶界中深部和尾部受主陷阱态以及背表面电势的影响,开发了用于完全耗尽多晶硅薄膜晶体管的基于直流表面电势的漏极电流模型。通过沿反型层垂直于多晶硅/氧化物界面垂直集成电子浓度,并使用平均电场概念,推导出具有沟道电势的反型电荷的面密度,以计算扩散分量和漂移分量。为了简化求解过程,使用梯形法则来避免漂移电流计算中的数值积分。为了进一步提高整个通道未完全反转的区域的计算精度,在一定的数学约束下采用三角法代替了梯形法则在漂移电流计算中的使用。在不同的状态密度下,通过二维器件仿真在各种漏极偏置下器件的传输特性中验证了该基于表面电势的漏极电流模型。

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