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Effects of Temperature on Surface Accumulation and Release of Silica Nanoparticles in an Epoxy Nanocoating Exposed to UV Radiation

机译:温度对暴露于紫外线辐射下的环氧纳米涂层中二氧化硅纳米颗粒表面累积和释放的影响

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Polymer nanocoatings are increasingly used outdoors and in harsh environments. However, because most common polymers degraded by the weathering elements, nanoparticles in polymer nanocoatings may be released into the environments. Such nanoparticle release potentially poses an environmental health and safety risk. This study investigated the effects of temperature on the surface accumulation and release of nanosilica for an epoxy nanocoating exposed to ultravioiet (UV) radiation. Specimens of an amine-cured epoxy containing 5 mass % nanosilica were exposed to 295 nm to 400 ran UV radiation at three temperatures (40 ℃, 50 ℃, and 60 ℃). Surface accumulation and release of nanosilica as a function of UV dose were measured by atomic force microscopy and inductively-coupled plasma optical emission spectrometry, respectively. Nanosilica accumulated rapidly on specimen surface at low UV doses but the rate of accumulation slowed down at high UV doses. Further, the amount of surface accumulation increased with increasing temperature. The mass of Si release increased with increasing temperature for high UV doses; but at low doses, the trend was different: the mass of Si release was greatest at 50 ℃ and smallest at 60 ℃. Kinetic parameters derived from this study are essential for developing credible models to predict the long term risks of polymer nanocoatings used outdoors.
机译:聚合物纳米涂料越来越多地在室外和恶劣环境中使用。但是,由于大多数普通的聚合物会被耐候性元素降解,因此聚合物纳米涂层中的纳米颗粒可能会释放到环境中。这样的纳米颗粒释放潜在地构成环境健康和安全风险。这项研究调查了温度对暴露于紫外线(UV)辐射的环氧纳米涂料的纳米二氧化硅表面累积和释放的影响。在三个温度(40℃,50℃和60℃)下,将含有5%质量%纳米二氧化硅的胺固化环氧树脂的样品暴露于295 nm至400 nm的UV辐射下。纳米二氧化硅的表面积累和释放随紫外线剂量的变化分别通过原子力显微镜和电感耦合等离子体发射光谱法测量。在低紫外线剂量下,纳米二氧化硅迅速在样品表面积累,但是在高紫外线剂量下,纳米二氧化硅的积累速度减慢。此外,表面积累的量随着温度的升高而增加。对于高剂量的紫外线,随着温度的升高,硅的释放量增加。但是在低剂量下,趋势有所不同:硅释放的质量在50℃时最大,而在60℃时最小。从这项研究得出的动力学参数对于开发可靠的模型以预测户外使用的聚合物纳米涂层的长期风险至关重要。

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