首页> 外文会议>EUV and X-ray Optics: Synergy between Laboratory and Space VI >A comparison of customized Hartmann and newly introduced Inverted Hartmann masks for single-shot phase-contrast X-ray imaging
【24h】

A comparison of customized Hartmann and newly introduced Inverted Hartmann masks for single-shot phase-contrast X-ray imaging

机译:定制的Hartmann和新推出的Inverted Hartmann掩模用于单次相衬X射线成像的比较

获取原文
获取原文并翻译 | 示例

摘要

In this contribution, we compare the performance of Hartmann masks and inverted Hartmann masks of different periodsfor phase-sensitive X-ray imaging. The Hartmann masks were gold meshes and the inverted Hartmann masks werearrays of gold pillars, both manufactured by UV lithography and gold electroforming on low-absorbing graphitesubstrates. We asses masks performance by comparing the visibility and homogeneity of the periodic patterns.Manufactured customized masks exhibit clear periodic patterns and demonstrate visibility values from 30 % to 50 %depending on the setup configuration. Finally, we show the phase contrast imaging with an angular resolution of 1.5 μradand demonstrate that images obtained with an inverted Hartmann mask have superior quality.
机译:在这项贡献中,我们比较了相敏X射线成像的不同周期的Hartmann掩模和反Hartmann掩模的性能。 Hartmann掩模是金网,倒置的Hartmann掩模是金柱的阵列,都是通过UV光刻和在低吸收性石墨衬底上进行电铸金来制造的。我们通过比较周期性图案的可见性和均匀性来评估掩膜的性能。\ r \ n制造的定制掩膜显示出清晰的周期性图案,并根据设置配置展示出30%至50%\ r \ n的可见性值。最后,我们显示了具有1.5μrad\ r \ n的角分辨率的相衬成像,并证明了使用反向Hartmann掩模获得的图像具有卓越的质量。

著录项

  • 来源
  • 会议地点 0277-786X;1996-756X
  • 作者单位

    Karlsruhe Institute of Technology (KIT), Institute of Microstructure Technology (IMT), Hermannvon-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany;

    Karlsruhe Institute of Technology (KIT), Institute of Photon Science (IPS), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany;

    Karlsruhe Institute of Technology (KIT), Institute of Microstructure Technology (IMT), Hermannvon-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany;

    Karlsruhe Institute of Technology (KIT), Institute of Microstructure Technology (IMT), Hermannvon-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany;

    Karlsruhe Institute of Technology (KIT), Institute of Photon Science (IPS), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany, Karlsruhe Institute of Technology (KIT), Laboratory for Applications of Synchrotron Radiation (LAS), Kaiserstr. 12, 76131 Karlsruhe, Germany;

    Karlsruhe Institute of Technology (KIT), Institute of Photon Science (IPS), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany, Karlsruhe Institute of Technology (KIT), Laboratory for Applications of Synchrotron Radiation (LAS), Kaiserstr. 12, 76131 Karlsruhe, Germany,Heidelberg University, Centre for Organismal Studies Heidelberg, Im Neuenheimer Feld 230, 69120 Heidelberg, Germany;

    Karlsruhe Institute of Technology (KIT), Institute of Photon Science (IPS), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany, Karlsruhe Institute of Technology (KIT), Laboratory for Applications of Synchrotron Radiation (LAS), Kaiserstr. 12, 76131 Karlsruhe, Germany;

    Karlsruhe Institute of Technology (KIT), Institute of Microstructure Technology (IMT), Hermannvon-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-26 14:32:33

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号