Direct Write 3-Dimensional Nanopatterning using Probes

摘要

A high-resolution probe based patterning method is presented using organic resists that respond to the presence of a hot tip by local material desorption. Thereby arbitrarily shaped patterns can be written in the organic films in the form of a topographic relief. The patterning process is highly reproducible and repeatable enabling the creation complex relief structures with arbitrary texture also in the vertical dimension. The patterns can be readily transferred into silicon using standard RIE technology. The new technique offers a cost-effective and competitive alternative to high-resolution electron-beam lithography in terms of both resolution and speed.