EUV radiation from gas-puff laser plasma focused by Multi-foil optics

摘要

We present the recent progress in high intensity micro focused EUV beam generation. Ellipsoidal thin glass foils were used in Multi-foil optical systems for focusing radiation in 50 eV to 150 eV energy band from gas-puff laser plasma source. Multifoil optic (MFO) condenser was designed and tested for applications with Xe laser plasma gas-puff source. High intensity EUV beam focal spot was recorded, analyzed and compared with theoretical results from computer ray-tracing. Direct EUV lithography using radiation induced decomposition and ablation of TEFLON was studied.