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Nanofabrication of free-standing spectroscopic photon sieves operating in soft X-ray region

机译:在软X射线区域中运行的独立式光谱光子筛的纳米加工

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摘要

A novel design of X-ray spectroscopic photon sieves (SPS) was realized to eliminate the higher diffraction orders. SPS gratings consist of randomly distributed circular holes, forming an approximately sinusoidal transmission function. Due to the intensive absorption of soft X-rays in any known material, these gold nanoholes are free-standing without supporting membrane. For applications in soft X-ray region, a hybrid lithographic method was used to manufacture spectroscopic photon sieves (SPS) of 1000 lines/mm in high throughput. In the fabrication process, an electron beam was focused to write patterns on the membrane substrate to achieve a master mask. Using this mask XRL and gold electroplating were performed to efficiently replicate SPS structures. After that, UVL was used to define the supporting coarse frame. In the replication process of XRL, the deviation of circle patterns caused by overheating problem in exposure has been resolved by inserting appropriate filters in X-ray beam path. The spectrum of X-ray source for exposure can be restricted in the 1.0-2.0 keV energy band. Therefore, less heat are produced in exposure due to less absorption of higher energy X-rays in resist. After the SPS has been finished, the diffraction pattern was achieved at the soft X-ray beam line on Beijing Synchrotron Radiation Facility. The calibration results show that higher-order diffraction orders were efficiently suppressed along the axis of symmetry.
机译:实现了一种新颖的X射线光谱光子筛(SPS)设计,以消除更高的衍射级。 SPS光栅由随机分布的圆形孔组成,形成近似正弦的透射函数。由于在任何已知材料中都会大量吸收软X射线,因此这些金纳米孔是独立的,没有支撑膜。对于在软X射线区域中的应用,使用混合光刻方法以高通量制造1000线/毫米的光谱光子筛(SPS)。在制造过程中,将电子束聚焦以在膜基板上写入图案,从而获得主掩模。使用该掩模进行XRL和电镀金,以有效地复制SPS结构。之后,使用UVL定义支撑的粗框架。在XRL的复制过程中,通过在X射线束路径中插入适当的滤镜,解决了由曝光中的过热问题导致的圆形图案偏差。可以将用于曝光的X射线源的光谱限制在1.0-2.0 keV的能带中。因此,由于在抗蚀剂中较少吸收较高能量的X射线,因此在曝光中产生的热量较少。 SPS完成后,在北京同步辐射仪上的软X射线束线上获得了衍射图样。校准结果表明,沿对称轴有效抑制了高阶衍射级。

著录项

  • 来源
    《Advances in X-ray/EUV optics and components XII 》|2017年|103860Q.1-103860Q.8|共8页
  • 会议地点 San Diego(US)
  • 作者单位

    Key Laboratory of Microelectronic Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, 3 Beitucheng West Road, Beijing China 100029;

    Science and Technology on Plasma Physics Laboratory, Research Center of Laser Fusion, China Academy of Engineering Physics, P.O. Box 919-986, Mianyang, Sichuan China 621900;

    Key Laboratory of Microelectronic Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, 3 Beitucheng West Road, Beijing China 100029;

    Science and Technology on Plasma Physics Laboratory, Research Center of Laser Fusion, China Academy of Engineering Physics, P.O. Box 919-986, Mianyang, Sichuan China 621900;

    Key Laboratory of Microelectronic Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, 3 Beitucheng West Road, Beijing China 100029;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Spectroscopic photon sieves; soft X-ray; nanofabrication; free-standing nanostructures; characterization;

    机译:光谱光子筛;软X射线纳米加工独立的纳米结构;表征;

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