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Characterization of broadband emission around 40 nm from potassium plasma

机译:钾等离子体在40 nm左右的宽带发射特性

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摘要

We characterize the emission spectra of a potassium plasma and its temporal behavior at 39 nm. To understanding the potassium spectral behavior without contamination effect, we use a laser-produced plasma to control the plasma parameters by changing the laser intensity and wavelength. Potassium ions produced strong broadband emission around 40 nm ranging from K~(3+) to K~(5+) ions at a time-averaged electron temperature of about 12 eV. Emission at 39 nm is caused during the recombining phase and it was reproduced by hydrodynamic simulation, which accounted for atomic processes. As the emission spectral behavior of the laser-produced potassium plasma XUV source is similar to that of the hollow cathode-mode discharge-produced plasma spectrum, it indicates that the emission from the discharge-produced plasma occurs in a region of high electron density close to 10~(20) cm~(-3).
机译:我们表征了钾等离子体的发射光谱及其在39 nm处的时间行为。为了了解没有污染效应的钾光谱行为,我们使用激光产生的等离子体通过改变激光强度和波长来控制等离子体参数。在约12 eV的时间平均电子温度下,钾离子在40 nm附近产生了从K〜(3+)到K〜(5+)离子的强宽带发射。在重组阶段引起39 nm的发射,并通过流体动力学模拟再现了该现象,这是原子过程的原因。由于激光产生的钾等离子体XUV源的发射光谱行为类似于空心阴极模式放电产生的等离子体光谱的发射光谱行为,因此表明来自放电产生的等离子体的发射发生在电子密度高的区域中。至10〜(20)cm〜(-3)

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  • 来源
    《Advances in x-ray/EUV optics and components VI》|2011年|p.81390U.1-81390U.10|共10页
  • 会议地点 San Diego CA(US)
  • 作者单位

    Department of Electrical and Electronic Systems Engineering, Utsunomiya University,Yoto 7-1-2, Utsunomiya, Tochigi, Japan 321-8585;

    Department of Electrical and Electronic Systems Engineering, Utsunomiya University,Yoto 7-1-2, Utsunomiya, Tochigi, Japan 321-8585;

    Department of Electrical and Electronic Systems Engineering, Utsunomiya University,Yoto 7-1-2, Utsunomiya, Tochigi, Japan 321-8585;

    Department of Advanced Interdisciplinary Sciences, Utsunomiya University,Yoto 7-1-2, Utsunomiya, Tochigi, Japan 321 -8585,Center for Optical Research Education (CORE), Utsunomiya University,Yoto 7-1-2, Utsunomiya, Tochigi, Japan 321-8585,Japan Science and Technology Agency, CREST,4-1-8 Honcho, Kanagawa, Saitama, Japan 332-0012;

    Department of Electrical and Electronic Systems Engineering, Utsunomiya University,Yoto 7-1-2, Utsunomiya, Tochigi, Japan 321-8585 ,Center for Optical Research Education (CORE), Utsunomiya University,Yoto 7-1-2, Utsunomiya, Tochigi, Japan 321-8585,Japan Science and Technology Agency, CREST,4-1-8 Honcho, Kanagawa, Saitama, Japan 332-0012;

    Department of Advanced Interdisciplinary Sciences, Utsunomiya University,Yoto 7-1-2, Utsunomiya, Tochigi, Japan 321 -8585,Center for Optical Research Education (CORE), Utsunomiya University,Yoto 7-1-2, Utsunomiya, Tochigi, Japan 321-8585;

    School of Physics, University College Dublin, Belfield, Dublin, Ireland 4;

    School of Physics, University College Dublin, Belfield, Dublin, Ireland 4;

    School of Physics, University College Dublin, Belfield, Dublin, Ireland 4;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用光学;
  • 关键词

    extreme ultraviolet; capillary; discharge-and laser-produced plasmas; morphology application;

    机译:极紫外线毛细管放电和激光产生的等离子体;形态学应用;

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