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CHARACTERZATION OF Ge-Sb-Te PHASE-CHANGE MEMORY MATERIALS

机译:Ge-Sb-Te相变记忆材料的表征

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Phase-change memory materials are promising for the next generation of non-volatile flash memory that will serve in new mobile computing entertainment and other handheld electronics. Among them are chalcogenide glasses Ge-Sb-Te (GST) which can exist in two separate structural states - amorphous and crystalline. Switching of the material from one to another state can be done by heating applying an electrical pulse or by exposure to intense laser beam. In the present work we report the changes of optical parameters of amorphous Ge_1Sb_2Te_4, Ge_1Sb_4Te_7, and Ge_2Sb_2Te_5 thin films under heat treatment and light exposure. The illumination with white during 1 hour does not change the transmission spectra of the as-deposited amorphous film. The spot of phase change transformation of the amorphous material was observed when the film was illuminated with UV laser pulses. From the transmission spectra T=f(λ) the optical constants (Absorption coefficient α, optical band gap E_g, refractive index n, the average electronic energy gap E_0 and the dielectric oscillator strength E_d were calculated. For Ge_1Sb_2Te_4 the value of E_0 is smaller than optical band gap E_g=1.08 eV obtained from the Tauc plot. Large values of the refractive index n are obtained for smaller E_0=0.931 eV and for large E_d=7.448 eV. The anealing of the amorphous Ge_2Sb_2Te_5 thin film at T=100 ℃ during t=4 min shifts the transmission spectra in the low frequency region. The anealing at higher temperatures makes the thin film non-transparent, e.g. take place the process of crystalization.
机译:相变存储材料有望用于下一代非易失性闪存,将在新型移动计算娱乐和其他手持电子产品中使用。其中有硫族化物玻璃Ge-Sb-Te(GST),可以两种独立的结构状态存在-非晶态和结晶态。可以通过加热施加电脉冲或通过暴露于强激光束来完成将材料从一种状态切换到另一种状态。在目前的工作中,我们报告了在热处理和曝光条件下非晶Ge_1Sb_2Te_4,Ge_1Sb_4Te_7和Ge_2Sb_2Te_5薄膜的光学参数的变化。在1小时内用白色照射不会改变所沉积的非晶膜的透射光谱。当用UV激光脉冲照射膜时,观察到非晶材料的相变转变点。根据透射光谱T = f(λ),计算出光学常数(吸收系数α,光学带隙E_g,折射率n,平均电子能隙E_0和介电振荡器强度E_d。对于Ge_1Sb_2Te_4,E_0的值较小比从Tauc图获得的光学带隙E_g = 1.08 eV大;对于较小的E_0 = 0.931 eV和对于较大的E_d = 7.448 eV,可以获得较大的折射率n值;在T = 100℃下对非晶Ge_2Sb_2Te_5薄膜进行退火处理在t = 4分钟内,透射光谱在低频区域发生偏移,高温下的退火会使薄膜不透明,例如发生结晶过程。

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