Frontier Research Lab., Samsung Advanced Institute of Technology, Yongin-si, Kyonggi-do, Korea, 446-712;
Frontier Research Lab., Samsung Advanced Institute of Technology, Yongin-si, Kyonggi-do, Korea, 446-712;
Frontier Research Lab., Samsung Advanced Institute of Technology, Yongin-si, Kyonggi-do, Korea, 446-712;
Frontier Research Lab., Samsung Advanced Institute of Technology, Yongin-si, Kyonggi-do, Korea, 446-712;
Frontier Research Lab., Samsung Advanced Institute of Technology, Yongin-si, Kyonggi-do, Korea, 446-712;
Frontier Research Lab., Samsung Advanced Institute of Technology, Yongin-si, Kyonggi-do, Korea, 446-712;
Frontier Research Lab., Samsung Advanced Institute of Technology, Yongin-si, Kyonggi-do, Korea, 446-712;
Frontier Research Lab., Samsung Advanced Institute of Technology, Yongin-si, Kyonggi-do, Korea, 446-712;
Frontier Research Lab., Samsung Advanced Institute of Technology, Yongin-si, Kyonggi-do, Korea, 446-712;
Frontier Research Lab., Samsung Advanced Institute of Technology, Yongin-si, Kyonggi-do, Korea, 446-712;
Frontier Research Lab., Samsung Advanced Institute of Technology, Yongin-si, Kyonggi-do, Korea, 446-712;
colloidal quantum dot; nanoscale patterning; electron beam lithography; lift-off process; surface plasmon generator; finite-difference time-domain simulation;
机译:在透明和金属平面上的胶体量子点的纳米级图案
机译:胶体量子点的纳米级和单点图案。
机译:金属纳米线中与胶体量子点耦合的表面等离激元:散射特性和量子纠缠
机译:表面等离子体一代胶体量子点的纳米级图案
机译:纳米光电应用固态胶体量子点的复杂折射率建模和纳米级图案化
机译:使用量子点在纳米带状波导上映射束缚等离激元传播:间隔层厚度的影响
机译:胶体量子点的纳米级和单点图案化