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Near-Infrared Photodetection with Molecular Beam Epitaxy Grown Extended InGaAs

机译:分子束外延生长InGaAs的近红外光检测

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摘要

Strain-balanced In_xGa_(1-x)As/In_yGa_(1-y)As superlattices and fractional monolayer In_(0.532)Ga_(0.468)As/InAs superlattices were grown by solid-source molecular beam epitaxy (SSMBE) in order to extend the photodetection wavelength range beyond 1.7μm. Material qualities were characterized by transmitted electron microscope (TEM), X-ray diffraction (XRD), room-temperature photoluminesecence (RTPL) and optical absorption measurement.
机译:应变平衡In_xGa_(1-x)As / In_yGa_(1-y)As超晶格和分数单层In_(0.532)Ga_(0.468)As / InAs超晶格通过固体源分子束外延(SSMBE)进行生长光电探测波长范围超过1.7μm。通过透射电子显微镜(TEM),X射线衍射(XRD),室温光致发光(RTPL)和光吸收测量来表征材料质量。

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