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Proton Radiation Effects on the Analog Performance of Bulk n- and p-FinFETs

机译:质子辐射对n型和p型FinFET的模拟性能的影响

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摘要

This paper presents an evaluation of the impact of 60 MeV Proton radiation on triple gate Bulk FinFETs, for both n and p types. The main focus is intrinsic voltage gain, threshold voltage and the OFF region drain current. The narrow nFinFET devices present an unexpected degradation of the drain current in the off-state region, which shows that the radiation affects severely the STI oxide resulting in a high parasitic conduction. The pFinFETs are more tolerant than the nFinFETs for environments that suffer from high-energy proton exposure.
机译:本文介绍了n型和p型60 MeV质子辐射对三栅极本体FinFET的影响。主要重点是本征电压增益,阈值电压和OFF区漏极电流。狭窄的nFinFET器件在截止状态区域中会出现漏电流的意外下降,这表明辐射严重影响STI氧化物,从而导致高寄生传导。在遭受高能质子暴露的环境中,pFinFET比nFinFET更具耐受性。

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  • 会议地点 Chicago IL(US)
  • 作者单位

    LSI/PSI/USP, University of Sao Paulo, Sao Paulo, Brazil;

    LSI/PSI/USP, University of Sao Paulo, Sao Paulo, Brazil;

    LSI/PSI/USP, University of Sao Paulo, Sao Paulo, Brazil;

    Imec, Leuven, Belgium;

    Imec, Leuven, Belgium ,E.E. Dept., KU Leuven, Belgium;

    LSI/PSI/USP, University of Sao Paulo, Sao Paulo, Brazil;

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  • 正文语种 eng
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  • 入库时间 2022-08-26 14:19:37

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