Change of Crystalline Anisotropy after Laser Scribing in 3 SiFe Measured by Second Harmonics

摘要

The profiles of the second harmonics during B-H hysteresis loop have been measured as functions of the tensile stress in laser scribed 3 % SiFe. The harmonics profiles have been analyzed in terms of the nonlinear, asymmetric magnetization which reflects the domain reorientation under the field. The peak field interval of the second harmonics is related to nucleation and annihilation field. The nucleation field of 0.9 kA/m due to crystalline anisotropy increases up to 1.43 kA/m after laser scribing in [1 1 0] axial sample.