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The Dependence of Mechanical Strain on a-Si:H TFTs and Metal Connection Fabricated on Flexible Substrate

机译:机械应变对a-Si:H TFT的依赖性以及在柔性基板上制造的金属连接

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摘要

We evaluated a-Si:H TFTs fabricated on polyimidernsubstrate (PI) at the highest temperature of 160 Crnwith uniaxial and tensile strain to imitate flexiblerndisplay. With tensile strain, the threshold voltage of a-rnSi:H TFTs have positive shift due to extra danglingrnbond formation in a-Si:H layer. However, nornsignificant degradation of the subthreshold swing andrneffective mobility with tensile strain of a-Si:H TFTsrnindicates the similar level of band tail state. The metalrnwire with the width of 10 m for connection onrnflexible substrate can sustain with curvature radiusrn2.5 cm.
机译:我们评估了在160 rn的最高温度下在聚酰亚胺衬底(PI)上制造的a-Si:H TFT,其具有单轴和拉伸应变,以模仿柔性显示器。对于拉伸应变,由于在a-Si:H层中形成了额外的悬挂键,a-rnSi:H TFT的阈值电压具有正向偏移。然而,a-Si:H TFT的拉伸应变对亚阈值摆幅和有效迁移率的影响不明显,表明带尾态的水平相似。用于连接柔性基板的宽度为10 m的金属线可以保持曲率半径为2.5 cm。

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  • 会议地点 Daegu Exhibition Convention Center (EXCO)(KR);Daegu Exhibition Convention Center (EXCO)(KR);Daegu Exhibition Convention Center (EXCO)(KR);Daegu Exhibition Convention Center (EXCO)(KR)
  • 作者单位

    Display Technology Center,Industrial Technology Research Institute (DTC/ITRI),Hsinchu,Taiwan Phone:+886-3-5912337,E-mail: MinHungLee@itri.org.tw;

    Display Technology Center,Industrial Technology Research Institute (DTC/ITRI),Hsinchu,Taiwan;

    Display Technology Center,Industrial Technology Research Institute (DTC/ITRI),Hsinchu,Taiwan;

    Display Technology Center,Industrial Technology Research Institute (DTC/ITRI),Hsinchu,Taiwan;

    Display Technology Center,Industrial Technology Research Institute (DTC/ITRI),Hsinchu,Taiwan;

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