首页> 外文会议>2019年第66回応用物理学会春季学術講演会講演予稿集 >Berry Curvature Study of hBN-Bilayer Graphene Heterostructure
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Berry Curvature Study of hBN-Bilayer Graphene Heterostructure

机译:hBN-双层石墨烯异质结构的浆果曲率研究

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摘要

Introduction of Berry's phase and related effects has led to the study of yet another degree of freedom in electrons i.e. valley degree of freedom and a brand new branch of research, Valleytronics . This degree of freedom gives scope for a novel information carrier for electronic devices, apart from the charge and spin degree of freedom . Berry phase has given rise to various physical properties such as Berry curvature and orbital magnetic moment. Berry curvature, which can be described as a pseudo-magnetic field in the reciprocal space drives the carriers to the opposite edges of the materials according to the direction of the curvature in the presence of an in-plane electric field. This phenomenon is called Valley Hall Effect (VHE). There have been several studies on the valleytronics properties of bilayer graphene (BLG). However, the valleytronic properties of hBN-bilayer graphene heterostructure are not studied extensively. hBN is widely used as a clean and uniform dielectric layer for bilayer graphene. Thus, herein, we study the valleytronics properties of the hBN-BLG heterostructure.
机译:Berry相和相关效应的引入导致人们对电子的另一个自由度进行了研究,即谷底自由度和一个崭新的研究分支Valleytronics。除了电荷和自旋自由度之外,这种自由度为电子设备的新型信息载体提供了范围。浆果相引起了各种物理性质,例如浆果曲率和轨道磁矩。浆果曲率,可以描述为互易空间中的伪磁场,在存在平面内电场的情况下,根据曲率的方向将载流子驱动到材料的相对边缘。这种现象称为谷霍尔效应(VHE)。关于双层石墨烯(BLG)的谷电子学性质已经有一些研究。然而,hBN双层石墨烯异质结构的谷电子性质尚未得到广泛研究。 hBN被广泛用作双层石墨烯的清洁且均匀的介电层。因此,在本文中,我们研究了hBN-BLG异质结构的谷电子学性质。

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