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Rapid Scan In-Situ FT-IR Curing Studies of Low-Temperature Cure Thin Film Polymer Dielectrics in Solid State

机译:固态低温固化薄膜聚合物电介质的快速扫描原位FT-IR固化研究

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Rapid scan in-situ Fourier Transform Infrared Spectroscopy (FT-IR) was used to characterize the cure process of two common low-temperature cure thin film polymer materials for wafer-level packaging applications. Beside a discussion of the spectral changes during the cure reaction, aspects of quantification the degree of cure will be shown. First, a photosensitive low-temperature cure ester-type polyimide precursor was investigated. As this material is a negative working photosensitive polyimide precursor, the impact of the photo-crosslinking on the imidization rate will be discussed in comparison to unexposed films. It will be shown, that at certain temperature / time conditions the exposure dose should be carefully adjusted to yield fully imidized films with minimized cure temperatures. Second, the thermosetting process of a low-k polymer dielectric based on divinyl siloxane bis-benzocyclobutene (DVS bis-BCB) was studied. Due to the chemical nature of the DVS bis-BCB resin a highly crosslinked network is formed during the cure process. Especially above 80% degree of cure at temperatures below 210°C a significant reduction of the reaction rate was measured. A two step cure process was developed, which can minimize the process time at elevated temperatures and yield a rather high degree of conversion in a reasonable process time. Both polymer cure reactions are characterized by a chemically-controlled and a diffusion controlled region with significant different reaction rates. Based on the aforementioned results a time, temperature and conversion dependent kinetic / diffusion model was used to describe the experimental data quantitatively. This model allows calculating very precisely the conversion in dependence on both, temperature and time, which will help to optimize the cure process for the two thin film polymers with respect to thermal budget and / or process time. Therefore this paper shows a method, which will help comparing different thin film polymer formulations regarding cure kinetics. Modeling of the data allows optimizing the process conditions to meet the temperature requirements in the area of wafer-level packaging and 3D integration.
机译:快速扫描原位傅里叶变换红外光谱(FT-IR)用于表征两种常见的低温固化薄膜聚合物材料在晶圆级封装应用中的固化过程。除了讨论固化反应过程中的光谱变化外,还将显示固化程度的量化方面。首先,研究了感光性低温固化酯型聚酰亚胺前体。由于这种材料是负性光敏聚酰亚胺前体,因此与未曝光的膜相比,将讨论光交联对酰亚胺化率的影响。结果表明,在一定的温度/时间条件下,应谨慎调整曝光剂量,以产生具有最小固化温度的完全酰亚胺化的薄膜。其次,研究了基于二乙烯基硅氧烷双苯并环丁烯(DVS bis-BCB)的低k聚合物电介质的热固性工艺。由于DVS bis-BCB树脂的化学性质,在固化过程中会形成高度交联的网络。尤其是在低于210°C的温度下高于80%的固化度,反应速度明显降低。开发了一种两步固化方法,该方法可以使在高温下的处理时间最小化,并在合理的处理时间内获得相当高的转化率。两种聚合物固化反应均以化学控制区和扩散控制区为特征,反应速率明显不同。根据上述结果,使用时间,温度和转化率相关的动力学/扩散模型来定量描述实验数据。该模型允许根据温度和时间非常精确地计算转化率,这将有助于在热预算和/或过程时间方面优化两种薄膜聚合物的固化过程。因此,本文显示了一种方法,该方法将有助于比较有关固化动力学的不同薄膜聚合物配方。数据建模可优化工艺条件,以满足晶圆级封装和3D集成领域的温度要求。

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