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Applying automatic chemical control from stock prep to the machine

机译:从备料到机器应用自动化学控制

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Controlling consistency in the pulping and bleach plant sectors is done according to certain well-defined standards, and gives accurate and reliable results. Consistency remains an essential and basic parameter that must be controlled to ensure process performance. At the paper machine, white water consistency control has been accepted as an industry standard. This control strategy is well known and has proven efficient and beneficial. Now, we are advancing wet end control to the next level. Combining retention aid control and charge demand control with coagulant or fixative in the thick-stock area provides additional benefits. Retention aid control by Whitewater consistency was developed in parallel with charge demand control. The advances in charge control are mainly thanks to sustained efforts of Mutek Analytic, an international lab instrument supplier. Developing this type of control has lead the industry to a much better understanding of charge demand and the impact of charge variation on retention aid efficiency. It is important to understand that all chemicals used in the pulp and paper manufacturing process affect paper machine runnability and performance. Chemicals used for bleaching often carry over to the wet end, disturbing the final performance of retention aid, dye, coagulant and wet/dry strength chemicals. This paper attempts to impart further understanding in the area of wet end chemistry control. New results are presented for both retention control and charge control, and to bridge the gap between the two control concepts.
机译:制浆和漂白工厂部门的一致性控制是根据某些明确定义的标准完成的,并提供准确而可靠的结果。一致性仍然是必不可少的基本参数,必须对其进行控制以确保过程性能。在造纸机上,白水浓度控制已被接受为行业标准。这种控制策略是众所周知的,并已证明是有效和有益的。现在,我们正在将湿端控制提高到一个新的水平。将保留助剂控制和电荷需求控制与厚浆区的凝结剂或固定剂结合使用可带来更多好处。与白水需求控制同时开发了通过白水浓度控制保留助剂的方法。电荷控制的进步主要归功于国际实验室仪器供应商Mutek Analytic的不懈努力。开发这种类型的控制已经使业界对电荷需求以及电荷变化对助留剂效率的影响有了更好的了解。重要的是要理解,制浆和造纸过程中使用的所有化学药品都会影响造纸机的运行性能。用于漂白的化学药品经常会转移到湿端,从而破坏了助留剂,染料,凝结剂和湿/干强度化学药品的最终性能。本文试图在湿部化学控制领域给予进一步的了解。提出了用于保留控制和电荷控制的新结果,并弥合了两种控制概念之间的差距。

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