首页> 外文会议>42nd international symposium on microelectronics (IMAPS 2009) >Indium Thermal Interface Material Assembly Manufacturability and Reliability
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Indium Thermal Interface Material Assembly Manufacturability and Reliability

机译:铟热界面材料组装的可制造性和可靠性

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Bonding silicon to an external copper lid with a solder requires extensive process development. This includes siliconrnmetallization development, metallization of the lid cavity, extensive assembly process development to ensure good control inrnthermal interface material (TIM) bond line thickness (BLT), minimal voids at the interface, and the metallic bonding meeting allrnrelevant reliability tests. Among many reliability tests performed to ensure product field life, high-temperature storage (HTS)rntest is critical. Therefore, a comprehensive HTS test was conducted to study its impact on thermal performance, inter-metallicrncompound (IMC) formation and growth, voids, and stability of BLT.rnTwo indium-TIM attachment methods were studied: pre-attached indium approach and indium pre-form approach.rnPre-attach refers to pre-attaching indium-TIM on a lid cavity prior to assembling lid/indium with the microprocessor package.rnIndium pre-form refers to bonding indium pre-form to lid and silicon concurrently. HTS was conducted on thermal test vehiclesrn(TTVs) built with indium to measure thermal resistance at each read point of HTS. Research found no significant change ofrnthermal resistance up to 1,000 hrs of HTS at 125℃. C-SAM was used to monitor structural changes in indium such as voidrnsize. There is no significant change in voids after 1,000 hrs of HTS.rnSEM and TEM were used to study IMC formation at each HTS read point. Two types of IMC were identified: AuIn2rnand In27Ni10. This research found that IMC thickness at the indium/silicon interface is very stable and does not increase withrnHTS time. However, significant IMC thickness increase is observed at the lid/indium interface. This observation can bernexplained by the nickel layer thickness used in the lid cavity and silicon backside. However, the increase of IMC at thernlid/indium interface does not result in any thermal degradation or reliability degradation. This study concludes that indium-rnTIM is stable under HTS test.
机译:用焊料将硅粘结到外部铜盖上需要大量的工艺开发。这包括硅金属化开发,盖腔金属化,广泛的组装工艺开发,以确保良好地控制热界面材料(TIM)键合线厚度(BLT),界面处的空洞最少以及满足所有相关可靠性测试的金属键合。在确保产品现场寿命的众多可靠性测试中,高温存储(HTS)测试至关重要。因此,进行了全面的高温超导试验,以研究其对BLT的热性能,金属间化合物(IMC)的形成和生长,空隙和稳定性的影响。研究了两种铟-TIM附着方法:预附着铟方法和铟预形式的方法。rn预连接是指在用微处理器封装组装盖/铟之前,先将铟-TIM预连接到盖腔中。rn铟预成型是指同时将铟预成型件结合到盖和硅上。 HTS是在装有铟的热测试车(TTV)上进行的,以测量HTS的每个读取点的热阻。研究发现,在125℃的高温下,长达1000小时的热阻没有显着变化。 C-SAM用于监测铟的结构变化,例如空隙尺寸。在HTS放置1000小时后,空隙没有显着变化。使用rnSEM和TEM研究每个HTS读取点的IMC形成。确定了两种类型的IMC:AuIn2rn和In27Ni10。这项研究发现,铟/硅界面处的IMC厚度非常稳定,并且不会随HTTS时间的增加而增加。然而,在盖/铟界面处观察到IMC厚度显着增加。该观察结果可以通过盖腔和硅背面中使用的镍层厚度来解释。但是,在rnlid /铟界面上的IMC的增加不会导致任何热降解或可靠性下降。这项研究得出的结论是,铟-TIM在HTS测试中是稳定的。

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