首页> 外文会议>30th European Solid-State Device Research Conference, Sep 11-13, 2000, Cork, Ireland >A comparison between semi-classical and quantum-mechanical escape-times for gate current calculations
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A comparison between semi-classical and quantum-mechanical escape-times for gate current calculations

机译:半经典逃逸时间与量子力学逃逸时间之间的比较,用于栅极电流计算

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摘要

In this paper the semi-classical and quantum-mechanical definitions of escape-time from quasi-bound states have been compared in the frame of MOSFET gate leakage-current calculations. The theoretical background and the numerical issues involved in the implementation of these approaches inside device simulators have been compared. Results on many different thin gate-oxide capacitors, and on a special purpose test structure with mercury-probe contact, point out that the semi-classical approach is faster, less demanding from the numerical point of view, and surprisingly accurate compared to the fully quantum-mechanical treatment of more physically-sound models.
机译:本文在MOSFET栅极泄漏电流计算的框架内,比较了准结合态的逃逸时间的半经典和量子力学定义。比较了在设备模拟器内部实施这些方法所涉及的理论背景和数值问题。在许多不同的薄型栅极氧化物电容器上以及在带有汞探针接触的特殊用途测试结构上的结果均指出,与传统方法相比,半经典方法更快,从数值角度来看要求较低,并且出乎意料地准确物理力学模型的量子力学处理。

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