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Highly Crystalline Silicon Thin Films Grown by ECRCVD For The Applications of Crystalline Silicon Solar Cells

机译:通过ECRCVD生长的高结晶硅薄膜用于结晶硅太阳能电池

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摘要

Highly crystalline growth of semiconductors at low substrate temperatures has been a fascination of many investigators through the years.Silicon thin films highly doped with phosphor (P) and boron (B) were grown below 200℃ by electron cyclotron resonance chemical vapor deposition (ECR–CVD) on both side of p-type cryatlline Si (c-Si) wafers.
机译:多年来,许多研究人员一直着迷于在低衬底温度下半导体的高结晶生长。通过电子回旋共振化学气相沉积(ECR–),在200℃以下生长了高度掺杂有磷(P)和硼(B)的硅薄膜。 CVD)在p型晶硅Si(c-Si)晶圆的两面。

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  • 来源
  • 会议地点 Hangzhou(CN)
  • 作者单位

    Optical Science Center, National Central University, Jhongli 320, R.O.C;

    Department of Optics and Photonics, National Central University, Jhongli 320, R.O.C;

    Department of Optics and Photonics, National Central University, Jhongli 320, R.O.C;

    Department of Optics and Photonics, National Central University, Jhongli 320, R.O.C;

    Department of Optics and Photonics, National Central University, Jhongli 320, R.O.C;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 太阳能技术;
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