METHOD FOR MANUFACTURING CRYSTALLINE SILICON THIN FILM AND SOLAR CELL UTILIZING CRYSTALLINE SILICON THIN FILM

摘要

PPROBLEM TO BE SOLVED: To provide a technology capable of forming a silicon thin film having good crystallinity even when scanning rate is raised in the formation of the silicon thin film using a zone melting recrystallization process, and to provide a solar cell using the formed silicon thin film. PSOLUTION: This method for manufacturing a crystalline silicon thin film comprises recrystallizing a polycrystalline silicon layer with smooth surface by the zone melting recrystallization process, after forming a heat-resistant layer for peeling such as a silicon oxide layer, silicon nitride layer, etc., and a polycrystalline silicon layer with smooth surface on a heat-resistant substrate; or after forming a heat-resistant layer for peeling such as a silicon oxide layer, silicon nitride layer, etc., and a polycrystalline silicon layer on the heat-resistant substrate, and smoothing the surface of the polycrystalline silicon layer; or after forming a heat-resistant layer for peeling such as a silicon oxide layer, silicon nitride layer, etc., and a thin amorphous silicon layer on the heat-resistant substrate. PCOPYRIGHT: (C)2003,JPO