The application of TRIZ algorithm solve the problem of byproduct Hsin, Yi-Fang

摘要

During the Lamp anneal process of the diffusion equipment, the heated and vaporized byproduct of the wafer adhered to the upper surface of the Quartz of the chamber and thermal probes beneath the reflector plate. It caused a malfunction in temperature feedback which resulted in a high risk for RS value monitoring. The tool recovery was done by means of frequent PM and the failure phenomenon only was detected by the data of the daily RS monitoring. The research used TRIZ innovation methodology which included the model of the technical contradictions, physical contradictions, and the inventive theory of asymmetry - preliminary action, nesting, extraction principles, to optimize the design and improve the Lamp anneal process of diffusion machine. The inventive embodiment consisted of the following four parts as: 1. Add the wafer Pre-clean step, 2. Change the design of blowing ports, 3. Change the design of air inlet, 4. Adjust the structure of the chamber (Figure 5). Above part 2-3 are key inventions to be implemented and will change the air flow to reduce the adhersion of vaporized byproduct completedly. Part 1 & 4 are optional to improve the reduction of adhersion more effectively. In addition, the simulation of airflow rate distribution manifested that the distribution of flow velocity could be changed and produced a gradually higher speed airflow from the top to the bottom. The out-gassing of the wafer near the backside could be expelled by the airflow of lower area while keeping original airflow distribution of upper area. The invention reduced the probability of vaporized byproduct adhering to the quartz and lessen the wafer surface thermal effect, so that the process reached stability and machine up-time was soaring.