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Lead chalcogenide films grown by pulsed laser deposition

机译:通过脉冲激光沉积法生长的硫属元素铅薄膜

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摘要

Three lead chalcogenide films, PbTe, PbSe, and PbS, with a high structural quality were grown by pulsed lased deposition. The films were grown on single crystal substrates (Si, KCl, Al2O3) and on Si covered with a Si3N4 buffer layer. The Si3N4 layer latter facilitated the lead chalcogenide layer nucleation during the first growth stages and resulted in a more homogeneous surface morphology and a lower surface roughness. The surface geometry (roughness) of the films grown on Si3N4 was studied by means of the power spectral density analysis.
机译:通过脉冲激光沉积生长了三层具有高结构质量的硫族化物铅薄膜,即PbTe,PbSe和PbS。薄膜在单晶衬底(Si,KCl,Al 2 O 3 )和覆盖有Si 3 N 4 缓冲层。 Si 3 N 4 层在最初的生长阶段促进了硫族元素铅层的成核,并导致更均匀的表面形态和更低的表面粗糙度。通过功率谱密度分析研究了在Si 3 N 4 上生长的薄膜的表面几何形状(粗糙度)。

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