首页> 外文会议>2017 5th International Conference on Electrical Engineering - Boumerdes >Inhomogeneous barrier height effect on the current-voltage characteristics of a W/4H-Sic Schottky diode
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Inhomogeneous barrier height effect on the current-voltage characteristics of a W/4H-Sic Schottky diode

机译:势垒高度不均匀对W / 4H-Sic肖特基二极管的电流-电压特性的影响

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Silicon carbide (SiC) is an important semiconductor material used in power electronics. Due to its high hardness and brittleness. The SILVACO-TCAD numerical simulator is used to calculate the I-V characteristic of the Schottky diode (W/4H-SiC) in the temperature range of 303-448 K. This is to study the effect of temperature on the I-V curves and assess the main parameters that characterize the Schottky diode such as the ideality factor, the height of the barrier and the series resistance. The I-V characteristics are analyzed on the basis of standard thermionic emission (TE) theory and the inhomogeneous barrier heights (BHs) assuming a Gaussian distribution. It is shown that the ideality factor decreases while the barrier height increases with increasing temperature, on the basis of TE theory. Furthermore, the homogeneous BH value of approximately 1.48 eV for the device has been obtained from the linear relationship between the temperature-dependent experimentally effective BHs and ideality factors. The modified Richardson plot, according to inhomogeneity of the BHs, has a good linearity over the temperature range. The evaluated Richardson constant A* was 141.86 A·cm-2·K-2, which is close to the theoretical value of 146 A·cm-2·K-2 for n-4H-SiC. The temperature dependence of the I-V characteristics of the W/4H-SiC Schottky diode have been successfully explained on the basis of thermionic emission (TE) mechanism with Gaussian distribution of the Schottky barrier heights (SBHs). Simulated I-V characteristics are in good agreement with the measurements [Boussouar L et al. Microelectronic Engineering Vol. 88, pp. 969-975, 2011]. The barrier height obtained using Gaussian Schottky barrier distribution is 1.48 eV which is about half the band gap of 4H-SiC
机译:碳化硅(SiC)是用于电力电子设备的重要半导体材料。由于其高硬度和脆性。 SILVACO-TCAD数值模拟器用于计算在303-448 K温度范围内肖特基二极管(W / 4H-SiC)的IV特性。这是为了研究温度对IV曲线的影响并评估主要表征肖特基二极管的参数,例如理想因子,势垒高度和串联电阻。根据标准热电子发射(TE)理论和假设高斯分布的非均匀势垒高度(BHs)分析I-V特性。根据TE理论,随着温度的升高,理想因子减小,势垒高度增加。此外,已从与温度有关的实验有效BH与理想因子之间的线性关系获得了该器件的均匀BH值,约为1.48 eV。根据BH的不均匀性,修改后的Richardson图在整个温度范围内具有良好的线性。理查森常数A *的评估值为141.86 A·cm -2 ·K -2 ,接近理论值146 A·cm -2 < / sup>·K -2 对于n-4H-SiC。在具有肖特基势垒高度(SBHs)的高斯分布的热电子发射(TE)机制的基础上,已经成功地解释了W / 4H-SiC肖特基二极管的I-V特性与温度的关系。模拟的I-V特性与测量结果非常吻合[Boussouar L等。微电子工程学报88,第969-975页,2011年]。使用高斯肖特基势垒分布获得的势垒高度为1.48 eV,约为4H-SiC带隙的一半

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