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Gas environment type and pressure influence on the semiconductor thin films electrical properties

机译:气体环境类型和压力对半导体薄膜电性能的影响

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The topic timeliness is due to the semiconductor films widespread use in optoelectronic systems and the atmospheric gases adsorption influence on the film semiconductor devices operability. The study subject is to set the space charge area sign of zinc and cadmium chalcogenide films in the hydrogen, carbon monoxide (II) environment and their mixture by electrical conductivity measurements. Thin semiconductor films complex studies have proved the gaseous environment form and its pressure impact on the chalcogenide films electrical properties. The gas environments adsorbed components on the film surface compared to the vacuum lead to negative charge in the space charge area (p-CdTe) and to positive charge when there is hydrogen adsorption (n-CdSe). When using film in the wet air its surface oxidation and aging lead to opposite change in its charging nature as compared with the vacuum environment. The energy interval width (ΔE0) when exposed to gaseous environments is increased for n-CdSe to 18% in carbon monoxide (II) atmosphere, and it increases to 30% in hydrogen atmosphere. For compounds p-CdTe the similar values are respectively 13 and 17%. A method for stabilizing n-CdSe surface electrical properties by hydrogen annealing at T = 673K followed with thermovacuuming.
机译:主题的及时性是由于半导体膜在光电系统中的广泛使用以及大气中的气体吸附对膜半导体器件的可操作性的影响。研究对象是通过电导率测量来设置氢,一氧化碳(II)环境及其混合物中的硫属元素锌和镉的镉膜的空间电荷面积符号。半导体薄膜的复杂研究证明了气态环境的形成及其压力对硫族化物薄膜电性能的影响。与真空相比,气体环境在膜表面上吸附的成分导致空间电荷区域中的负电荷(p-CdTe),并且在存在氢吸附时导致正电荷(n-CdSe)。当在湿空气中使用薄膜时,与真空环境相比,其表面氧化和老化会导致其充电性质发生相反的变化。对于一氧化碳(II)大气,当暴露于气体环境时,能量间隔宽度(ΔE0)对于n-CdSe增加到18%,而在氢气氛中增加到30%。对于化合物p-CdTe,相似值分别为13%和17%。一种通过在T = 673K​​进行氢退火并进行热真空处理来稳定n-CdSe表面电性能的方法。

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