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Fabrication of perpendicular magnetic anisotropic Nd-Fe-B based thin films through annealing Nd-Fe-B/Nd-Fe multilayer

机译:通过退火Nd-Fe-B / Nd-Fe多层膜制备垂直磁各向异性Nd-Fe-B基薄膜

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摘要

This study presents a way of achieving high perpendicular coercivity by post-annealing Ta/NdFeB/NdFe/NdFeB/Ta multilayer films deposited by evaporation method on Si substrate at 650°C. The demagnetization curves of the multilayer film have shoulders close to zero applied field, indicating that there exist some soft magnetic phases in the film. Microstructure characterization is carried out to understand the coercivity mechanism. The strong perpendicular magnetic anisotropy of the film is mainly attributed to the partial textured structure, which is confirmed by micromagnetic simulation.
机译:本研究提出了一种通过在650°C下对通过蒸发法沉积在Si衬底上的Ta / NdFeB / NdFe / NdFeB / Ta多层薄膜进行后退火的方法来实现高垂直矫顽力的方法。多层膜的退磁曲线的肩部接近于零施加磁场,表明该膜中存在一些软磁相。进行微结构表征以了解矫顽机理。膜的强垂直磁各向异性主要归因于部分纹理结构,这已通过微磁模拟得到证实。

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