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Influence of current annealing on the magnetic properties of amorphous and crystalline soft thin films

机译:电流退火对非晶态和结晶态软薄膜磁性能的影响

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In this study, the magnetic properties of thin films prepared by sputtering are presented, before and after submission to current annealing [1]. Three compositions of soft magnetic materials are investigated: CoFeSiB, FeSiB, FeSiPBCu. Hysteresis loops and magnetic domain imaging (MOKE, MFM), together with structural techniques (EDX, TEM, XRD), are used to follow the effects of annealing, which include stress relaxation and crystallization .
机译:在这项研究中,介绍了通过溅射制备的薄膜的磁性,这些薄膜在进行当前退火之前和之后[1]。研究了软磁性材料的三种成分:CoFeSiB,FeSiB,FeSiPBCu。磁滞回线和磁畴成像(MOKE,MFM)以及结构技术(EDX,TEM,XRD)用于跟踪退火的效果,其中包括应力松弛和结晶。

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