Graduate School of Engineering, University of Fukui 3-9-1 Bunkyo, Fukui 910-8507, Japan;
Aluminum oxide; Annealing; Dielectric constant; Films; Insulators; Interface states; Logic gates; Alinf2/infOinf3/inf; GaN; MIS diode; ZrOinf2/inf;
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机译:<![CDATA [PBO的物理特征吗?ZRO
机译:快速热退火对掺杂Ga的Mg
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机译:重费米和非费米液体行为,超导电性和磁性低电子金属。
机译:趋磁细菌中磁铁矿(Fe(inf3)O(inf4))和钙铁矿(Fe(inf3)S(inf4))的受控生物矿化
机译:退火对4H-SiC衬底上作为UV抗反射涂层的Al