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On noise properties of transistors and amplifiers a critical review

机译:关于晶体管和放大器的噪声特性的评论

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It has been previously shown that the allowed values of minimum noise temperature Tmin and N=Roptgn (Lange noise parameter) for any transistor have to satisfy inequality 1≤4NT0/Tmin≤2. Furthermore, it has been shown that in the useful frequency range for all transistors 4NT0/Tmin≈2. Experimental confirmations have been published for III–V FETs, HEMTs, HBTs (in several different technologies including GaN HEMTs), and CMOS devices. This paper examines the consequences of this fact for widely held and widely published assumptions in the treatment of noise in transistors and amplifiers, amongst those CMOS “gate induced noise” concept and CMOS “noise cancelling” amplifiers. It is shown that some long held concepts need to be reexamined. The discussion is illustrated with experimental data.
机译:先前已经表明,任何晶体管的最小噪声温度Tmin和N = Roptgn(兰格噪声参数)的允许值必须满足不等式1≤4NT0/Tmin≤2。此外,已经显示在所有晶体管的有用频率范围内4NT0 /Tmin≈2。已经发布了针对III–V FET,HEMT,HBT(包括GaN HEMT在内的几种不同技术)和CMOS器件的实验确认。本文研究了这一事实在晶体管和放大器的噪声处理中被广泛使用和广泛发表的假设的后果,其中包括CMOS“栅极感应噪声”概念和CMOS“降噪”放大器。结果表明,一些长期存在的概念需要重新审查。该讨论用实验数据说明。

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