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Micro-structure characterization based on white light interferometry

机译:基于白光干涉法的微结构表征

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White light interferometry(WLI) has grown to be a standard measurement method in the field of microano manufacture. Vertical white light scanning interferometry(VSl), tilt white light scanning interferometry(TSl) and white light phase shifting interferometry(WLPSI) are introduced in this paper. A new algorithm based on the combination of VSI and image segmentation technology for measuring the film is presented in this paper. TSI is taken place of VSI for expanding its lateral measuring range and improving the testing efficiency as the vertical and lateral information of the samples are obtained after one time scan. Carre phase shifting is combined with vertical white light scanning which formed a white light phase shifting method. The measurement system equips a Mirau microscopic interferometer, and the scanning process is driven by nano-measuring machine(NNM) which is a high precision nano-positioner. At last, the testing results of some micro-structures illustrate the capabilities of the proposed algorithms.
机译:白光干涉法(WLI)已经发展成为微/纳米制造领域的标准测量方法。介绍了垂直白光扫描干涉法(VSl),倾斜白光扫描干涉法(TSl)和白光相移干涉法(WLPSI)。提出了一种基于VSI和图像分割技术相结合的胶片测量新算法。 TSI代替了VSI,以扩大其横向测量范围并提高测试效率,因为一次扫描后即可获得样品的垂直和横向信息。 Carre相移与垂直白光扫描相结合,形成了白光相移方法。测量系统配备了Mirau显微干涉仪,扫描过程由纳米测量仪(NNM)驱动,这是一种高精度的纳米定位器。最后,一些微结构的测试结果说明了所提出算法的功能。

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