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On-chip self-calibrated process-temperature sensor for TSV 3D integration

机译:用于TSV 3D集成的片上自校准过程温度传感器

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摘要

In TSV 3D integration, stacking multiple dies would face a severe challenge of the thermal stress and Vt scatter. In this paper, a fully on-chip self-calibrated process-temperature (PT) sensor is proposed to monitor the transistor variations (Vtn, Vtp) and temperature of the intra-die for 3D-ICs. The process information and temperature can be decoupled using the process-sensitive and temperature-dependent ring oscillators. Based on TSMC 65nm CMOS process, this sensor achieves 367.5 pJ per conversion, and the sensitivities of Vtn, Vtp and the inaccuracy of temperature are merely ±1.6mV, ±0.8mV, and ±1.5ºC, respectively.
机译:在TSV 3D集成中,堆叠多个管芯将面临热应力和Vt散布的严峻挑战。在本文中,提出了一种完全片上自校准过程温度(PT)传感器,以监控3D-IC的晶体管变化(Vtn,Vtp)和芯片内温度。可以使用对过程敏感的且取决于温度的环形振荡器来解耦过程信息和温度。该传感器基于TSMC 65nm CMOS工艺,每次转换可达到367.5 pJ,Vtn,Vtp的灵敏度和温度误差分别仅为±1.6mV,±0.8mV和±1.5ºC。

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