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Development of a through-stack-via integrated SRAM module

机译:开发通过堆栈的集成式SRAM模块

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In this paper, a through-stack-via integration process for SRAM module was developed using wafer level pre-patterned BCB bonding. A SRAM module with a built-in decoder has been designed according to this integration process. TSVs passed through all stacked SRAM chips and common signals, including address bus, data bus, power, write and read control, were connected to the same TSV using RDL. The chip select signals are individually connected to the built-in decoder. RDL was fabricated using lift-off process prior to wafer bonding and via filling. Double-layer spin coating technology was employed to prevent photoresist residues left in TSVs. With pre-patterned BCB adhesive bonding, a bottom-up TSV filling features as the last step, which eliminates the traditional solder bumping, flip chip bonding and underfill filling processes. Preliminary results have shown that this process is promising for integration of memory chips with similar layout.
机译:在本文中,使用晶圆级预图案化BCB键合为SRAM模块开发了一种通过堆栈的通孔集成工艺。根据此集成过程设计了带有内置解码器的SRAM模块。 TSV通过所有堆叠的SRAM芯片,并且使用RDL将公共信号(包括地址总线,数据总线,电源,写入和读取控制)连接到同一TSV。片选信号分别连接到内置解码器。 RDL是在晶片键合和通孔填充之前使用剥离工艺制造的。采用双层旋涂技术来防止残留在TSV中的光刻胶残留。借助预图案化的BCB粘合剂粘合,最后一步是自下而上的TSV填充,从而消除了传统的焊料凸块,倒装芯片粘合和底部填充工艺。初步结果表明,该工艺有望用于具有相似布局的存储芯片的集成。

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