首页> 外文会议>2012 25th International Symposium on Discharges and Electrical Insulation in Vacuum. >Microscopic observation and analysis of field electron emission sites by using an Electron Emission Microscope and Auger Electron Spectrometer
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Microscopic observation and analysis of field electron emission sites by using an Electron Emission Microscope and Auger Electron Spectrometer

机译:用电子发射显微镜和俄歇电子能谱仪对场电子发射位点进行微观观察和分析

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Field electron emission is recognized as one of important phenomena related to the occurrence of electrical breakdown in vacuum. In this paper, we investigated the distribution of field electron emission sites on a plane electrode before and after current conditioning procedure. The investigation was carried out by scanning the electrode to measure the emission current flowing through the pin-hole of the objective lens of Electron Emission Microscope. As a result, before current conditioning localized emission sites were found. Those emission sites and the current from the sites were unstable in the early stage of high voltage application. During current conditioning and electrode scanning, some of emission sites disappeared, while the others continued to flow current. Sometimes new emission sites appeared at the other points on the electrode surface. After the investigation of emission sites distribution, microscopic observation on some of emission sites were carried out by using the Electron Emission Microscope. Electron emission microscope enables simultaneous observations of field electron emission image and photo electron emission image. The observation revealed that field electron emission occurred at the foreign particles on the electrode surface, and only some of them became electron emission sites. To characterize the emission sites, we observed the absorption current image and analyzed the chemical composition of the emission sites by using an Auger Electron Spectrometer. Observation and analysis suggest that the foreign particle was a semiconducting or insulating material composed of carbon.
机译:场电子发射被认为是与真空中电击穿的发生有关的重要现象之一。在本文中,我们研究了电流调节程序前后平面电极上场电子发射部位的分布。通过扫描电极以测量流过电子发射显微镜物镜的针孔的发射电流来进行研究。结果,在进行电流调节之前,发现了局部发射点。在高压应用的初期,那些发射点和来自这些点的电流是不稳定的。在电流调节和电极扫描期间,一些发射点消失了,而其他发射点继续流动。有时新的发射点出现在电极表面的其他位置。在研究了发射部位的分布之后,使用电子发射显微镜对一些发射部位进行了显微镜观察。电子发射显微镜能够同时观察场电子发射图像和光电子发射图像。观察发现,场电子发射发生在电极表面上的异物颗粒上,只有其中一部分成为电子发射位点。为了表征发射点,我们观察了吸收电流图像,并使用俄歇电子能谱仪分析了发射点的化学成分。观察和分析表明,异物颗粒是由碳组成的半导体或绝缘材料。

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