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Photochemical degradation of oxytetracycline hydrochloride in the presence of H2O2

机译:H 2 O 2 存在下盐酸土霉素的光化学降解

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Advanced oxidation process (AOPs) are technologies based on the intermediacy of hycroxyl radical and other radicals to oxidize recalcitrant, toxic nad no biodegradable cpmpounds to various by- products. In this paper, Oxytetracycline hydrochloride (OTC) was degraded inside a UV-H2O2 system which utilize hydroxyl radical generated from H2O2 to attack OTC. Concentration of H2O2, temperature and pH was varied in this experiment. To monitor OTC degradation, TOC and UV-VIS spectra analysis were carried out. Constant OTC concentration at 250 ppm was used. About 93.06% of TOC removal was achieved at 40°C and 1 eq mole ratio H2O2 to OTC. After 180 min irradiation, UV-Vis spectra of OTC have shown total disappearance of OTC peak. HPLC analyses has shown about 93.08% of OTC were degraded after 180 min irradiated inside UV-H2O2 system.
机译:先进的氧化工艺(AOP)是基于羟自由基和其他自由基的中间产物,可将难降解的,有毒的,可生物降解的化合物氧化为各种副产物的技术。本文通过利用H 2 O产生的羟基自由基在UV-H 2 O 2 系统中降解了土霉素盐酸盐(OTC)。 2 攻击OTC。本实验改变了H 2 O 2 的浓度,温度和pH。为了监测OTC降解,进行了TOC和UV-VIS光谱分析。使用250 ppm的恒定OTC浓度。在40°C和相对于OTC 1 eq摩尔比H 2 O 2 时,TOC去除率约为93.06%。照射180分钟后,OTC的UV-Vis光谱显示OTC峰完全消失。 HPLC分析表明,在UV-H 2 O 2 系统内照射180分钟后,约有93.08%的OTC降解。

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