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Electron transport properties of individual gallium nitride nanowire decorated with gold nanoparticles

机译:金纳米粒子修饰的单个氮化镓纳米线的电子输运性质

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Variations in the electron transport properties of individual n-type gallium nitride (n-GaN) nannowires decorated with gold (Au) nanoparticles as a function of nanowire diameter (∼50nm – 400nm) have been studied. GaN nanowires were grown by vapor-liquid-solid (VLS) process and single nanowire devices were fabricated by photolithography techniques. Gold nanoparticle (∼5nm–10nm) decoration was achieved by plasma enhanced chemical vapor deposition (PECVD). Two orders of magnitude drop of the current in gold decorated GaN nanowires compared to the bare GaN nanowires were observed. This effect is attributed to carrier depletion formed at the n-GaN nanowire/Au nanoparticle interface due to the formation of a metal-semiconductor Schottky junction. Variation in electrical conductivity of the nanowires with and without nanoparticles was highly dependent upon nanowire diameter for a constant nanowire length of 5µm. Bare GaN nanowire shows an exponential decrease in resistance (∼ 450 KΩ to 1 KΩ) with increase in nanowire diameter (∼ 50nm – 400nm). In case of Au-GaN nanowire, current-voltage measurements exhibited clear rectifying behavior, with the forward bias threshold voltage decreasing linearly with increasing nanowire diameter
机译:研究了用金(Au)纳米粒子装饰的单个n型氮化镓(n-GaN)纳米线的电子传输特性随纳米线直径(〜50nm – 400nm)的变化。 GaN纳米线通过气液固(VLS)工艺生长,单纳米线器件通过光刻技术制造。通过等离子增强化学气相沉积(PECVD)实现了金纳米粒子(〜5nm–10nm)的装饰。与裸GaN纳米线相比,金装饰的GaN纳米线中的电流下降了两个数量级。该效应归因于由于金属-半导体肖特基结的形成而在n-GaN纳米线/ Au纳米粒子界面处形成的载流子耗尽。对于5µm的恒定纳米线长度,带有和不带有纳米颗粒的纳米线的电导率变化高度依赖于纳米线直径。裸露的GaN纳米线显示出​​电阻随纳米线直径(〜50nm – 400nm)的增加呈指数下降(从450KΩ到1KΩ)。在Au-GaN纳米线的情况下,电流-电压测量显示出清晰的整流行为,正向偏置阈值电压随纳米线直径的增加而线性降低

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