首页> 外文会议>2003 Nanotechnology Conference and Trade Show Nanotech 2003 Vol.3 Feb 23-27, 2003 California, USA >Microstructure changes induced by low-energy high-temperature nitrogen ion implantation on vanadium-titanium alloys
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Microstructure changes induced by low-energy high-temperature nitrogen ion implantation on vanadium-titanium alloys

机译:钒钛合金中低能高温氮离子注入引起的组织变化

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A detailed structural and tribological characterization of unimplanted and low-energy, nitrogen implanted V5at. %Ti alloy is presented. Samples were nitrogen-implanted at 1,2 kV and 1 mA/cm2, up to a dose of 1E19 ions/cm2, at a temperature of 673 K. Alloys were analyzed in cross-section by transmission electron microscopy and electron dispersive x-ray. Depending on the deep from the surface, the ion beam treatment dramatically changes the microstructure of the material. Partial amorphization of the implanted alloy in a region of 250-800 nm in deep is observed, following by a fully crystalline region at 800-1000 nm in deep, where TiN precipitates and dislocations are imaged. A clear correlation between the microstructure of the implanted layer and the reported improvement in the tribological and mechanical properties has been demonstrated.
机译:未植入和低能量,氮气注入的V5at的详细结构和摩擦学特性。介绍了%Ti合金。在673 K的温度下,以1,2 kV和1 mA / cm2的浓度对样品进行氮注入,直至剂量为1E19离子/ cm2。通过透射电子显微镜和电子弥散X射线分析合金的横截面。根据表面的深浅,离子束处理会极大地改变材料的微观结构。在深250-800 nm的区域观察到植入合金的部分非晶化,然后在深800-1000 nm的完全结晶区域,其中TiN沉淀和位错被成像。已证明植入层的微观结构与所报道的摩擦学和机械性能的改善之间存在明显的相关性。

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