首页> 外文会议>2002 ASME International Mechanical Engineering Congress and Exposition , Nov 17-22, 2002, New Orleans, Louisiana >INTERFACE STRENGTH BETWEEN SUB-MICRON THIN FILMS IN OPENING AND SLIDING DELAMINATION MODES
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INTERFACE STRENGTH BETWEEN SUB-MICRON THIN FILMS IN OPENING AND SLIDING DELAMINATION MODES

机译:在打开和滑动脱层模式中,亚微米薄膜之间的界面强度

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摘要

Delamination between thin films is classified into two types: opening mode and sliding mode. Corresponding to each mode, there is the interface strength between thin films. This paper aims to evaluate interface strength between the sub-micron thin films for opening mode and sliding mode, respectively. We already developed the evaluation method of interface fracture toughness for opening mode on the basis of fracture mechanics concept elsewhere. Moreover, the evaluation method of sliding mode is proposed and the interface strength between thin films for an advanced LSI is evaluated as the fracture toughness by using both methods. In both modes, the stress singularity appears in the vicinity of the edge of interface and governs the delamination. The criterion of crack initiation for each mode is evaluated as the interface toughness. The fracture toughness at the edge of interface in sliding mode is lower than that in opening mode.
机译:薄膜之间的分层分为两种:打开模式和滑动模式。对应于每种模式,薄膜之间存在界面强度。本文旨在评估分别在打开模式和滑动模式下的亚微米薄膜之间的界面强度。我们已经在其他地方基于断裂力学的概念,开发了开放模式的界面断裂韧性评估方法。此外,提出了滑动模式的评估方法,并通过这两种方法评估了用于高级LSI的薄膜之间的界面强度作为断裂韧性。在两种模式下,应力奇异性都出现在界面边缘附近并控制分层。每种模式下裂纹萌生的标准被评估为界面韧性。滑动模式下界面边缘的断裂韧性低于开放模式。

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