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Macromodeling Temperature-Dependent Curl in CMOS Micromachined Beams

机译:CMOS微加工光束中与温度相关的卷曲的宏观建模

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摘要

Temperature sensitive curling is commonly observed in MEMS structures fabricated using a standard CMOS process. In this paper, a macromodel for vertical and lateral curling effects is derived by extending thermal multimorph theory for cantilever beams. Stresses induced by temperature change are lumped to form equivalent force and moment sources at the two ends of a beam. The macromodel is added onto an existing mechanical beam model which is used to build and simulate MEMS in a schematic view. Strain in the polysilicon layer of the CMOS microstructure leads to piezoresistance. The macromodel implementation includes computation of strain. The deflections in the lateral and vertical directions from simulations using the macro-model match finite-element analyses to within 3% and match experimental measurements to within 15%.
机译:通常在使用标准CMOS工艺制造的MEMS结构中观察到温度敏感的卷曲。在本文中,通过扩展悬臂梁的热多态理论,导出了垂直和横向卷曲效应的宏模型。由温度变化引起的应力集中在一起,在梁的两端形成等效的力和力矩源。将宏模型添加到现有的机械梁模型上,该模型用于在示意图中构建和模拟MEMS。 CMOS微结构的多晶硅层中的应变会导致压阻。宏模型的实现包括应变的计算。使用宏模型进行的有限元分析模拟得出的横向和纵向挠度在3%以内,而实验测量值在15%以内。

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